To provide a liquid droplet discharge method for discharging liquid droplets to a substrate with good productivity even when the warpage or undulation of the substrate is large.
The liquid droplet discharge method is configured to include discharge the liquid droplets to the surface to be coated of the substrate from a nozzle while relatively moving the nozzle and the substrate in a main scanning direction and has a warpage measuring process for measuring the uneven shape of the surface to be coated in a plurality of directions, an arrangement direction deciding process for determining the direction of the substrate with respect to the main scanning direction using the data of the uneven shape, an arrangement direction altering process for moving the substrate in the determined direction of the substrate and a discharge process for discharging the liquid droplets to the surface to be coated of the substrate while relatively moving the nozzle and the substrate. In the arrangement direction deciding process, a direction having a small unevenness difference of the surface to be coated in a plurality of the measured directions is determined as the main scanning direction.
Osamu Suzawa
Kazuhiko Miyasaka
Next Patent: APPARATUS AND METHOD FOR DISCHARGING DROPLETS