MANUFACTURE OF GAS DISCHARGE PANEL AND GAS DISCHARGE PANEL

Japanese Patent JP3444793

B2

PROBLEM TO BE SOLVED: To stabilize the film quality of a protective layer and stably provide a gas discharge panel with satisfactory discharge characteristic by emitting ultraviolet rays to a substrate in an atmosphere containing oxygen to reform the surface of the protective layer, in the manufacture of a gas discharge panel by use of a substrate having a dielectric layer and protective layer formed thereon.
SOLUTION: A substrate 4 to be worked is set on a RF electrode (substrate holder) 19, having a substrate heating and cooling mechanism and a FR bias applying mechanism in a vacuum chamber 18, argon gas from an argon gas inlet system 15 and oxygen gas from an oxygen gas inlet system 14 are introduced thereto, and the pressure within the vacuum chamber 18 is regulated by an evacuation system 16. RF power is applied to the RF electrode 19 to generate plasma on the protecting layer 3 of the substrate 4, and the surface of the protecting layer 3 is etched. Thereafter, the residual gas is evacuated, and oxygen gas is introduced from the oxygen gas inlet system. An ultraviolet ray emitting lamp 17 is lighted to reform the surface.

Hideaki Yasui
Junichi Hibino
Yusuke Takada
Hidetaka Higashino
Mitsuhiro Ohtani

JP24273098A

September 08, 2003

August 28, 1998

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Matsushita Electric Industrial Co., Ltd

H01J9/02; G09F9/313; H01J11/22; H01J11/34; H01J11/40; (IPC1-7): H01J9/02; G09F9/313; H01J11/02

JP8255562A
JP5234519A
JP594766A
JP6175515A
JP2000156153A
JP200057939A

Yoshihiro Morimoto

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