Title:
MANUFACTURE OF SHADOW MASK
Document Type and Number:
Japanese Patent JP3489276
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a highly accurate shadow mask where especially the diameter of each opening is large and openings are many, concerning the method of manufacturing a shadow mask by a photoetching method.
SOLUTION: In the manufacture of a shadow mask using an etching preventive layer, a gravure coating method by two pieces of gravure rolls 17a and 17b having ink cells with oblique spiral grooves is used as a method of applying an etching preventive layer. Besides, the directions of the turns of the oblique spiral grooves 26a and 26b of the two gravure rolls 17 are made reverse to each other.
Inventors:
Tatsuhiko Yamamoto
Hiroyuki Tomiho
Satoshi Tsunashima
Hiroyuki Tomiho
Satoshi Tsunashima
Application Number:
JP17875295A
Publication Date:
January 19, 2004
Filing Date:
July 14, 1995
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
C23F4/00; H01J9/14; (IPC1-7): H01J9/14; C23F4/00
Domestic Patent References:
| JP8111174A | ||||
| JP7121870A | ||||
| JP252066A | ||||
| JP63204249A | ||||
| JP6280051A | ||||
| JP5255868A |