MANUFACTURING METHOD OF SUBSTRATE HAVING COATING FILM HAVING AMINO GROUP ON ITS SURFACE

Title:

MANUFACTURING METHOD OF SUBSTRATE HAVING COATING FILM HAVING AMINO GROUP ON ITS SURFACE

Document Type and Number:

Japanese Patent JP2007322219

Kind Code:

A

Abstract:

To provide a method which enables the formation of the fine pattern of a reagent or the like at a desired position with good reproducibility.

This manufacturing method of a substrate includes a vapor deposition process for forming a coating film having an amino group on the surface of the substrate by heating a compound represented by the formula (1), wherein (R1is -NH2or -CH2NH2and R2is -NH2, -CH2NH2or -H) to form a monomer and vapor-depositing the monomer on the substrate. The surface of the substrate has at least a region comprising a first material and a region comprising a second material and the amount of the amino group present on the surface of the coating film having the amino group per a unit area is different between the surface of the region comprising the first material and the surface of the region comprising the second material. The manufacturing method of the substrate is also disclosed.

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Inventors:

SUZUKI YUJI
KASAGI NOBUHIDE
MIWA JUNICHI
YOSHIOKA KOSHIRO
SHIBAYAMA KENICHI
INOUE TAKASHI

Application Number:

JP2006151848A

Publication Date:

December 13, 2007

Filing Date:

May 31, 2006

Export Citation:

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Assignee:

UNIV TOKYO
KISCO LTD
DAISAN KASEI KK

International Classes:

G01N33/53; C08G61/02; C12M1/00; C12N15/09; G01N37/00

Domestic Patent References:

JP2005274368A	2005-10-06
JP2003212974A	2003-07-30
JP2005274368A	2005-10-06
JP2002340916A	2002-11-27

Foreign References:

WO2005017570A2

2005-02-24

Attorney, Agent or Firm:

Nozomi Watanabe
Haruko Sanwa
Hiroshi Fukushima

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