Title:
MASK FOR EXPOSURE AND OPTICAL RECORDING MEDIUM
Document Type and Number:
Japanese Patent JPH06259814
Kind Code:
A
Abstract:
PURPOSE: To precisely fit a hub to an optical recording medium independently of the track pitch at a low cost by forming a positioning pattern for fitting a hub on the optical recording medium with a mask for exposure having a positioning pattern for fitting a hub.
CONSTITUTION: A positioning pattern 46 concentric with a guide layer pattern 45 is formed on an optical recording medium 52 with a mask for exposure having a positioning pattern for fitting a hub. A hub is fixed so that a positioning pattern 26 concentric with a central hole 28 coincides with the positioning pattern 46.
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Inventors:
TAKI KAZUYA
Application Number:
JP4294493A
Publication Date:
September 16, 1994
Filing Date:
March 03, 1993
Export Citation:
Assignee:
BROTHER IND LTD
International Classes:
G11B7/24; G11B7/24097; G11B7/26; G11B23/00; (IPC1-7): G11B7/26; G11B7/24; G11B23/00