Title:
マスク処理装置及び基板処理装置
Document Type and Number:
Japanese Patent JP7425176
Kind Code:
B2
Abstract:
The inventive concept provides a mask treatment apparatus. The mask treatment may include a support unit that supports the mask, and a light irradiation unit that irradiate the mask with a light to adjust a critical dimension of a pattern formed in the mask, wherein the light irradiation unit includes a light source that generates the light, and a light modulation element that modulates the light generated by the light source and forms an irradiation pattern.
Inventors:
Kim, Tae Hee
John, Ji Hoon
Kim, Tae Shin
Chun, Young Dae
John, Young Yoon
John, Ji Hoon
Kim, Tae Shin
Chun, Young Dae
John, Young Yoon
Application Number:
JP2022212313A
Publication Date:
January 30, 2024
Filing Date:
December 28, 2022
Export Citation:
Assignee:
SEMES CO., LTD.
International Classes:
G03F7/20; G03F1/72
Domestic Patent References:
| JP11202474A | ||||
| JP2009021339A | ||||
| JP202197225A |
Attorney, Agent or Firm:
IBC Ichibancho Patent Attorney Corporation
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