To provide a vacuum vapor deposition device which deposits a flying material for vapor deposition by evaporation at a specified incident angle on a base film even in a state that the opening region of a shutter is narrowed by the adhesion of the flying material for vapor deposition.
The lower part of the aperture 10a of the deposition prevent plate 5 of the vacuum vapor deposition device 20 is provided with transversely moving and vertically moving movement mechanisms 21 and a crucible 22 housing the material 18 for vapor deposition is arranged thereon. The front end of an electron gun 4 is provided with a deflection coil 31. The movement of the moving mechanisms 21 and the deflection of an electron beam 17 are executed in accordance with a predetermined program according to the adhering state of the deposits on the shutter 6.
KUMAGAI HIDEETSU
SHIMANUKI MAKOTO
SASAKI JUN
