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Patent Searching and Data


Title:
MECHANISM FOR ADJUSTING CAMERA FOR SUBSTRATE INSPECTION APPARATUS
Document Type and Number:
Japanese Patent JP2009230023
Kind Code:
A
Abstract:

To provide a mechanism for adjusting a camera for a substrate inspection apparatus, for easily and highly accurately adjusting the setting of a super high resolution camera even in a state where a substrate to be inspected is moved and conveyed.

The mechanism for adjusting the setting position of the camera for a substrate inspection apparatus includes: a tilt adjustment mechanism having a base plate for adjustment prepared for attaching the camera body to a vertical attachment surface in a face-down state, and rotating the camera body around an axis vertical to the attachment surface; a height adjusting mechanism for moving the camera body in the vertical direction; a rotation adjusting mechanism for rotating the camera body around the lens center axis of the camera body; and a holding mechanism for fixedly holding the camera body.


Inventors:
TODA YASUO
KONO MASAKI
KOBAYASHI RYOSUKE
NOSE KENJI
Application Number:
JP2008077925A
Publication Date:
October 08, 2009
Filing Date:
March 25, 2008
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03B17/56; F16M11/12; G03B15/00; H04N5/225