To provide a method and an apparatus of measuring misregistration which enables rapid measurement of misregistration regardless of the number of measuring points on a substrate, and also to provide a reticle for measuring misregistration.

The method and apparatus of measuring misregistration comprises a process wherein a first round of exposure is conducted using a first repetitious pattern 21 of a pitch p1, and then a second round of exposure is conducted using a second repetitious pattern 22 of a pitch p2 to form a third repetitious pattern for measurement which has a shape according to an overlapping part of the first and second repetitious patterns on the substrate, a process of fetching a diffraction image of the third repetitious pattern, a process of calculating a line width of the third repetitious pattern based on brightness information of the fetched diffraction image, and a process of calculating a relative misregistration quantity between the first and second rounds of exposure based on the line width.