Title:
METHOD OF INSPECTING SEMICONDUCTOR CHIP
Document Type and Number:
Japanese Patent JP2001210684
Kind Code:
A
Abstract:
To provide a method of probe inspection that is superior in accuracy of the inspection.
Test patterns T, each having electrodes to which the head of a probe is contacted, are formed on a wafer W. When an inspection result indicating that a chip has a defect in electrical characteristics is repeated ten times continuously, whether the cause is due to adhesion or attachment of an insulating substance on the probe head or not is judged by conducting a needle-point test using the test pattern T. If the cause is judged to be due to adhesion or attachment of an insulating substance on the probe head, the probe inspection is conducted again on the ten chips, after cleaning the probe head.
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Inventors:
MUTSUKAWA KAZUHIRO
Application Number:
JP2000020573A
Publication Date:
August 03, 2001
Filing Date:
January 28, 2000
Export Citation:
Assignee:
ASAHI CHEMICAL MICRO SYST
International Classes:
G01R1/06; G01R31/28; H01L21/66; G01R31/26; (IPC1-7): H01L21/66; G01R1/06; G01R31/26; G01R31/28
Attorney, Agent or Firm:
Tetsuya Mori (2 others)
Previous Patent: CHUCKING MECHANISM OF PROBER
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