Title:
METHOD FOR MANUFACTURING CITALOPRAM, INTERMEDIATE THEREOF AND METHOD FOR MANUFACTURING THE INTERMEDIATE
Document Type and Number:
Japanese Patent JP2005008642
Kind Code:
A
Abstract:
To provide an industrially advantageous method for manufacturing citalopram at a low cost and in high yield, and to provide a new method for manufacturing a compound (compound [III]) represented by formula [III], which compound is a key compound in manufacturing citalopram.
Citalopram can be manufactured by reacting a compound represented by formula [IV] with 3-(dimethylamino)propyl chloride in the presence of at least one condensing agent selected from N,N,N',N'-tetramethylethylenediamine and 1,3-dimethyl-2-imidazolidinone. Further, a compound [III] can be easily manufactured through reduction and cyclization of a compound of formula [II].
Inventors:
IKEMOTO TETSUYA (JP)
ARAI NOBUHIRO (JP)
IKI MASAMI (JP)
KO EIKOKU (JP)
ARAI NOBUHIRO (JP)
IKI MASAMI (JP)
KO EIKOKU (JP)
Application Number:
JP2004245441A
Publication Date:
January 13, 2005
Filing Date:
August 25, 2004
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C07D307/87; C07B61/00; C07C29/14; C07C29/38; C07C33/46; C07C45/46; C07C49/813; C07C51/083; C07C51/265; C07C51/373; C07C65/34; (IPC1-7): C07D307/87; C07C29/38; C07C33/46; C07C45/46; C07C49/813; C07C51/265; C07C51/373; C07C65/34
Attorney, Agent or Firm:
Takashima Ichi
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