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Title:
超微粒子又は超微粒子集合体の製造方法
Document Type and Number:
Japanese Patent JP5233279
Kind Code:
B2
Abstract:
A process comprising disposing a target and an ionic liquid in a vacuum chamber and applying electric power to the target so as to conduct sputtering toward the ionic liquid, thereby producing, dispersed in the ionic liquid, ultrafine particles or ultrafine particle aggregates each composed of a multiplicity of ultrafine particles linked in the form of three-dimensional network. Highly dispersible ultrafine particles or ultrafine particle aggregates can be efficiently produced only by introducing the ionic liquid in a general-purpose sputtering apparatus. Further, because of the process making use of sputtering, it is feasible to produce ultrafine particles, or aggregates thereof, consisting of an alloy of two or more types of metals with different vapor pressures at a desired alloy composition ratio, and to produce ultrafine particles, or ultrafine particle aggregates, of a metal with high boiling point or sublimation point.

Inventors:
Kenji Sato
Kinya Suzuki
Application Number:
JP2007520153A
Publication Date:
July 10, 2013
Filing Date:
June 08, 2006
Export Citation:
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Assignee:
Bridgestone Corporation
International Classes:
B22F9/00; B22F1/054; B22F9/14; C23C14/00
Domestic Patent References:
JP2003245540A2003-09-02
JP2005147394A2005-06-09
JPH0417829U1992-02-14
JP2003245540A2003-09-02
JP2005147394A2005-06-09
JP2005035916A2005-02-10
JP2005048260A2005-02-24
JP2004292632A2004-10-21
JPH0417829U1992-02-14
Other References:
JPN6012053608; M.WAGENER、他2名: 'Preparation of metal nanosuspensions by high-pressure DC-sputtering on running liquids' Nanoph Nanocomposite Mater 2 , 1997, Page.149-154
JPN6012053610; Claudia C.Cassol、他4名: 'The Role of Pd Nanoparticles in Ionic Liquid in the Heck Reaction' J Am Chem Soc Vol.127 No.10, 20050316, Page.3298-3299
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa



 
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