Title:
METHOD FOR PRODUCING FLUOROMETHANE AND PRODUCT PRODUCED THEREBY
Document Type and Number:
Japanese Patent JP2006111611
Kind Code:
A
Abstract:
To provide a method for efficiently producing HFC-41 having high purity and usable as an etching gas for semiconductor and provide a product produced by the method.
The fluoromethane is produced by reacting methyl chloride with hydrogen fluoride in gaseous phase in the presence of a fluorination catalyst to obtain a mixture containing the fluoromethane and hydrogen chloride, introducing the mixture into a distillation column, separating the fluoromethane and hydrogen chloride as a column top fraction and purifying the fluoromethane.
Inventors:
ONO HIROMOTO
ARAI TATSUHARU
ARAI TATSUHARU
Application Number:
JP2005256674A
Publication Date:
April 27, 2006
Filing Date:
September 05, 2005
Export Citation:
Assignee:
SHOWA DENKO KK
International Classes:
C07C17/383; B01J23/26; B01J35/10; C07C17/20; C07C19/08; C07B61/00
Domestic Patent References:
JPS60116637A | 1985-06-24 | |||
JPS6013726A | 1985-01-24 | |||
JPS608235A | 1985-01-17 | |||
JPH0761944A | 1995-03-07 | |||
JPS608234A | 1985-01-17 | |||
JPS6016943A | 1985-01-28 | |||
JP4007330B | ||||
JP2001196455A | 2001-07-19 |
Foreign References:
WO1989010341A1 | 1989-11-02 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Yoshio Yoshio
Tetsuji Koga
Masaya Nishiyama
Takashi Ishida
Yoshio Yoshio
Tetsuji Koga
Masaya Nishiyama
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