Title:
METHOD FOR RECOVERING COPPER OXIDE FROM COPPER CHLORIDE- CONTAINING WASTE ETCHING SOLUTION AND APPARATUS THEREFOR
Document Type and Number:
Japanese Patent JP3525203
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for efficiently treating a copper chloride- containing waste etching solution with a reduced amount of sludge generated and recovering the sludge.
SOLUTION: In the method for recovering copper oxide from a copper chloride-containing waste etching solution, the waste etching solution as a solution to be treated is mixed with an aqueous alkali solution of ≥pH 11 at ≥50°C to prepare a mixed solution having ≥50°C and pH 6-11, dissolved copper ions in the mixed solution are precipitated as copper oxide and this copper oxide is recovered.
Inventors:
Tatsumi, Kenji
Wada, Shinji
Yugawa, Yasuhiro
Wada, Shinji
Yugawa, Yasuhiro
Application Number:
JP2000403389A
Publication Date:
May 10, 2004
Filing Date:
December 28, 2000
Export Citation:
Assignee:
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY
Tatsumi, Kenji
Wada, Shinji
MITSUBISHI CORP
Tatsumi, Kenji
Wada, Shinji
MITSUBISHI CORP
International Classes:
C01G3/02; C22B3/44; C22B7/00; C22B15/00; (IPC1-7): C01G3/02; C22B3/44; C22B7/00; C22B15/00
Attorney, Agent or Firm:
池浦 敏明
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