Title:
粒子ビームを用いた処理中に基板を保護する方法及び装置
Document Type and Number:
Japanese Patent JP5896540
Kind Code:
B2
Abstract:
The invention refers to a method and apparatus for protecting a substrate during a processing by at least one particle beam. The method comprises the following steps: (a) applying a locally restrict limited protection layer on the substrate; (b) etching the substrate and/or a layer arranged on the substrate by use of the at least one particle beam and at least one gas; and/or (c) depositing material onto the substrate by use of the at least one particle beam and at least one precursor gas; and (d) removing the locally limited protection layer from the substrate.
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Inventors:
Solsten Hoffman
Tristan Bure
Petra spies
Nicole Aus
Michael Budah
Dayana Cuja
Tristan Bure
Petra spies
Nicole Aus
Michael Budah
Dayana Cuja
Application Number:
JP2014044579A
Publication Date:
March 30, 2016
Filing Date:
March 07, 2014
Export Citation:
Assignee:
Carl Zeiss SGM Game Beher
International Classes:
G03F1/74; H01L21/302
Domestic Patent References:
| JP2115842A | ||||
| JP2006293361A | ||||
| JP2012078561A |
Foreign References:
| WO2010147172A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo