To form a uniform thin film on the surface to be film-formed of a large-scale substrate.
A molecular beam source cell 1 comprises a crucible 31 for accommodating a film-forming material, which accommodates also a particulate material with a higher heat conductivity than the film-forming material; a valve 33 arranged between the crucible 31 and a molecule-emitting hole 14 for emitting molecules of the film-forming material formed in the crucible 31 toward the surface to be film-formed; and furthermore, a means for limiting a molecule-emitting direction arranged in the molecule-emitting hole 14. The means for limiting the direction of emitting the molecules limits them so as to exit only from the vicinity of the peripheral part of the molecule-emitting hole 14, by blocking the exit of the molecules in a central portion of the molecule-emitting hole 14. The means for limiting the emitting direction of the molecules is in contact with a molecule-heating chamber 12 for heating the emitting molecules.
SAITOU TAKETOSHI
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