MONOMER FOR RESIST, POLYMER FOR RESIST AND ACID- DISSOCIABLE GROUP-CONTAINING RESIN

Title:

MONOMER FOR RESIST, POLYMER FOR RESIST AND ACID- DISSOCIABLE GROUP-CONTAINING RESIN

Document Type and Number:

Japanese Patent JP2003321409

Kind Code:

A

Abstract:

To obtain a monomer for forming a resist which has high transparency to radiation and satisfies basic performances required for the resist, a polymer for the resist and an acid-dissociable group-containing resin useful as a chemical amplification type resist.

The acid-dissociable group-containing resin is alkali-insoluble or alkali-slightly soluble, is readily made easily alkali-soluble by the action of an acid and has a repeating unit represented by formula (8) (R1 and R2 are each a fluorine atom-containing bifunctional organic group).

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Inventors:

NISHIKUBO TATATOMI
KAMEYAMA ATSUSHI
KUDO HIROTO

Application Number:

JP2002133993A

Publication Date:

November 11, 2003

Filing Date:

May 09, 2002

Export Citation:

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Assignee:

JSR CORP
UNIV KANAGAWA

International Classes:

G03F7/032; C07C31/44; C07C39/367; C07D303/27; C08G59/30; C08G59/62; G03F7/039; (IPC1-7): C07C31/44; C07C39/367; C07D303/27; C08G59/30; C08G59/62; G03F7/032; G03F7/039

Attorney, Agent or Firm:

Waki

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