To provide a monomer excellent in sensitivity, adhesion to an inorganic substrate and developability in a patterning application such as a photoresist.
The multifunctional monomer (A) bears six unsaturated groups and is obtained by causing glycidyl methacrylate to react with acrylic acid to synthesize 2-hydroxy-3-acryloyloxypropyl methacrylate and causing this to react with pyromellitic anhydride. The energy ray-curable resin composition is obtained using the same. The production method of a cured product of the same and an article having a layer of the cured product are also provided. The use of the multifunctional monomer (A) gives a resin composition comprising the same that has excellent sensitivity, high adhesion to an inorganic substrate and excellent developability in patterning of a negative photoresist.
COPYRIGHT: (C)2010,JPO&INPIT
IMASUMI KIKUO
OSHIMI KATSUHIKO
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