Title:
NEW COMPOUND, RESIST COMPOUND, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013220995
Kind Code:
A
Abstract:
To provide a compound capable of attaining a pattern having low line edge roughness in high sensitivity and high resolution, a negative resist composition using the compound, and a method for producing a resist pattern.
This invention relates to a compound represented by chemical formula (1) and its use.
Inventors:
OKUYAMA KENICHI
Application Number:
JP2012091798A
Publication Date:
October 28, 2013
Filing Date:
April 13, 2012
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
MITSUBISHI GAS CHEMICAL CO
MITSUBISHI GAS CHEMICAL CO
International Classes:
C07C39/12; C07C43/23; G03F7/004; G03F7/038; H01L21/027
Attorney, Agent or Firm:
Kishimoto Tatsuto
Akihiko Yamashita
Akihiko Yamashita