NEW TERTIARY ALCOHOL COMPOUND HAVING ALICYCLIC STRUCTURE

Title:

NEW TERTIARY ALCOHOL COMPOUND HAVING ALICYCLIC STRUCTURE

Document Type and Number:

Japanese Patent JP2002255877

Kind Code:

A

Abstract:

To obtain a new tertiary alcohol compound useful as a monomer for producing a photoresist material having excellent transparency and affinity for a substrate in a photolithography using an excimer laser at preferably ≤300 nm wavelength, especially preferably ArF excimer laser as a light source.

This tertiary alcohol compound is represented by general formula (1) (R1 and R2 are each independently a 1-10C straight-chain, branched-chain or a cyclic alkyl group; a part or the whole hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms; R1 and R2 may be mutually bonded to form an aliphatic hydrocarbon ring; Z is 2-10 straight-chain, branched-chain or cyclic bifunctional organic group; k is 0 or 1).

Inventors:

HASEGAWA KOJI
KANOU TAKESHI
WATANABE TAKESHI

Application Number:

JP2001388737A

Publication Date:

September 11, 2002

Filing Date:

December 21, 2001

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO

International Classes:

G03F7/039; C07C33/05; C07C33/12; C07C35/21; C08F32/08; H01L21/027; (IPC1-7): C07C33/05; C07C33/12; C07C35/21; G03F7/039; H01L21/027

Attorney, Agent or Firm:

Okuyama Shoichi (3 outside)

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