To provide a novel photopolymerizable monomer exhibiting high photopolymerizability, and a photosensitive composition that comprises the same and exhibits high film strength.

The polymerizable monomer has at least two of each of unit structures represented by formula 1 and formula 2. The photosensitive composition comprises the same in the molecule. In the formulae, VP1 is a phenyl group substituted with a vinyl group; L1 and L2 are each a bivalent linking group; R1-R4 are each H or an aliphatic group; and n is an integer of at least 1.