Title:
OPTICAL DEFECT DETECTOR
Document Type and Number:
Japanese Patent JPS6199845
Kind Code:
A
Abstract:
A method and apparatus for automatically detecting defects on the surfaces of semiconductor wafers (40) and chips which provides a 100% inspection capability. The entire surface of each water is scanned by use of a low magnification, low resolution detector (104) such as a photodiode array. Whenever a defect occurs, encoders (20) on the supporting XY table are triggered, such that the location of a defect on the wafer is recorded. After the event coordinates have been determined, the XY table positions each defect directly under a high magnification detector (204) to determine the nature of the detected event. Since only the locations of the detected events are stored, 100% of the processed wafers can be scanned for defects.
Inventors:
JIYOSEFU JIEEMUZU BURONTE
ROORANDO CHIYAARUZU HIIBATO
HENRI ANTOWAAN KUURII
ROORANDO CHIYAARUZU HIIBATO
HENRI ANTOWAAN KUURII
Application Number:
JP10169585A
Publication Date:
May 17, 1986
Filing Date:
May 15, 1985
Export Citation:
Assignee:
IBM
International Classes:
G01N21/88; G01B11/30; G01N21/93; G01N21/94; G01N21/95; G01N21/956; H01L21/66; (IPC1-7): G01B11/30; G01N21/88; H01L21/66
Domestic Patent References:
| JPS55112502A | 1980-08-30 | |||
| JPS498292A | 1974-01-24 | |||
| JPS5719647A | 1982-02-01 | |||
| JPS5910231A | 1984-01-19 | |||
| JPS5833154A | 1983-02-26 | |||
| JPS57113244A | 1982-07-14 |
Attorney, Agent or Firm:
Jiro Yamamoto
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