To provide a method and a device for safely and precisely controlling the ozone concentration of an ozone containing gas supplied to an ozone utilization system.
A processing apparatus 1 includes an ozone decomposition device 22 that controls the ozone concentration of an ozone containing gas with ozone concentration of 80 vol% or more, which is supplied to a high temperature processing chamber 24 from an ozone supply device 21 through an ozone supply line 11 at a constant flow rate, by controlling the supply of an ozone decomposition factor to the ozone containing gas. In the processing apparatus 1, under a condition that the flow rate of the ozone containing gas is constant, an ignition in the chamber 24 is detected based on a differential pressure between a gas supply line 11 and an exhaust line 12 of the high temperature processing chamber 24. The ozone decomposition device 22 controls the ozone concentration of the gas by controlling the irradiation intensity of a light beam including a wavelength within an ultraviolet light region which is supplied as the ozone decomposition factor to the ozone containing gas. Also, in place of the light including the ultraviolet light region, the heat may be used.
| JP2009281943A | 2009-12-03 | |||
| JP2010202452A | 2010-09-16 | |||
| JP2009206474A | 2009-09-10 | |||
| JP2009281943A | 2009-12-03 |
Uzawa Hidehisa
Tsuyoshi Hashimoto
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