Title:
PHASE SHIFTING MASK BLANK, PHASE SHIFTING MASK AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2002287323
Kind Code:
A
Abstract:
To provide a phase shifting mask blank provided with at least one phase shifting layer on a transparent substrate, in which the phase shifting layer comprises at least a metal and germanium.
The high quality phase shifting mask blank and the phase shifting mask the film thickness of which necessary to change the phase difference by 180° can be decreased are obtained by forming the phase shifting layer comprising at least a metal such as molybdenum, and germanium.
Inventors:
KANEKO HIDEO
INAZUKI SADAOMI
TSUKAMOTO TETSUSHI
OKAZAKI SATOSHI
INAZUKI SADAOMI
TSUKAMOTO TETSUSHI
OKAZAKI SATOSHI
Application Number:
JP2001084919A
Publication Date:
October 03, 2002
Filing Date:
March 23, 2001
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F1/32; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima (1 person outside)