Title:
PHOTOETCHING METHOD
Document Type and Number:
Japanese Patent JPS5216173
Kind Code:
A
Abstract:
PURPOSE:A method to make a hole by photoetching without causing faults such as pin hole, in the thick part and thin part of the film of uneven thickness.
Inventors:
TOMOSAWA AKIHIRO
ANSAI NORIO
SHIRASU TATSUMI
ANSAI NORIO
SHIRASU TATSUMI
Application Number:
JP9188275A
Publication Date:
February 07, 1977
Filing Date:
July 30, 1975
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L29/78; H01L21/302; H01L21/306; H01L21/3213; H01L29/76; (IPC1-7): H01L21/302; H01L21/88; H01L29/76
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