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Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2012167265
Kind Code:
A
Abstract:

To provide a photosensitive composition which can be cured with a small amount of energy even when a material such as a colorant attenuating or blocking light with which the material is irradiated, is present at high concentration or when film thickness of coating film is large.

The photosensitive composition includes: (1) a radical initiator (A); (2) a living radical polymerization initiator (L); (3) an acid generator (B) and/or a base generator (C); and (4) a polymerizable material (D). At least one of (A), (B) and (C) and (L) generate an active species (H) upon irradiation with actinic light. The active species (H) reacts with (A), (L), (B) or (C) to generate a new active species (I), and polymerization reaction of (D) under the new active species (I) proceeds. The active species (H) or (I) is an acid or a base.


Inventors:
MOTOFUJI AZUSAHEI
Application Number:
JP2012013579A
Publication Date:
September 06, 2012
Filing Date:
January 25, 2012
Export Citation:
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Assignee:
SANYO CHEMICAL IND LTD
International Classes:
C08F2/46; C08F4/32; C08F16/12; C08F20/14; C08F20/56; C08G59/68; C09K3/00; H01G4/12; H01G4/232; H01G4/30