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Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2012167266
Kind Code:
A
Abstract:

To provide a photosensitive composition capable of being cured by a small amount of energy even in the case where a substance such as a colorant attenuating or blocking irradiated light is present in a high concentration or the case of a thick film.

The photosensitive composition contains (1) a radical initiator (A), (2) an acid generator (B) and/or a base generator (C), and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (H) by irradiation of active light rays; at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (I) by heat; and the active species (H) and (I) react with the radical initiator (A), the acid generator (B) or the base generator (C) to form a new active species (J), which progresses the polymerization reaction of the polymerizable substance (D), and wherein at least one of active species (H), (I) and (J) is an acid or a base.


Inventors:
NAKAYAMA MASATOSHI
MOTOFUJI AZUSAHEI
Application Number:
JP2012013585A
Publication Date:
September 06, 2012
Filing Date:
January 25, 2012
Export Citation:
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Assignee:
SANYO CHEMICAL IND LTD
International Classes:
C08F2/48; C08F2/44; C08G65/10; C09K3/00; H01G4/12
Domestic Patent References:
JP2008015187A2008-01-24
JPH107709A1998-01-13
JPH04162040A1992-06-05
Foreign References:
WO2010143560A12010-12-16