Title:
感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品
Document Type and Number:
Japanese Patent JP7335217
Kind Code:
B2
Abstract:
The present invention is a photosensitive resin composition containing: (A) a resin; (B) a photosensitizer; (C) a surfactant containing a structural unit represented by the following average composition formula (1); and (D) a solvent, where Y1 and Y2 each independently represent a hydrogen atom, a methyl group, a phenyl group, or a group represented by the following general formula (2), at least one of Y1 and Y2 is a group represented by the following general formula (2), R1 to R6 are monovalent hydrocarbon groups that may be the same or different and optionally contain a heteroatom, having 1 to 20 carbon atoms, "l" and "n" are each independently integers of 1 to 100, and "m" is an integer of 0 to 100. This provides: a photosensitive resin composition that is excellent in film thickness uniformity at the time of application and that has reduced coating defects when forming a thick film; a patterning process performed using the photosensitive resin composition; a cured film formed by curing the pattern; and an electronic component having the cured film. (R1R2Y2SiO1/2)2(R3Y1SiO2/2)I(R5R6SiO2/2)n(R4SiO3/2)m (1)
Inventors:
Hiroyuki Urano
Kazuki Iio
Katsuya Takemura
Kazuki Iio
Katsuya Takemura
Application Number:
JP2020159730A
Publication Date:
August 29, 2023
Filing Date:
September 24, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08G77/52; G03F7/075; G03F7/004; G03F7/023; G03F7/027; G03F7/037
Domestic Patent References:
| JP2003255533A | ||||
| JP2015513690A | ||||
| JP2009265268A | ||||
| JP2017120346A | ||||
| JP2013100480A | ||||
| JP2019155837A | ||||
| JP2013060594A | ||||
| JP59069110A |
Foreign References:
| US20140113230 |
Other References:
PEG-11メチルエーテルジメチコンの基本情報・配合目的・安全性,化粧品成分オンライン,2023年05月09日,https://cosmetic-ingredients.org/surfactants-emulsifying-agents/15515/
PEG-3ジメチコンの基本情報・配合目的・安全性,化粧品成分オンライン,2023年05月16日,https://cosmetic-ingredients.org/surfactants-emulsifying-agents/12982/
CoatOSil* Additives for High Performance Coatings and Inks,Momentive Performance Materials Inc.,2023年05月09日,https://www.momentive.com/docs/default-source/productdocuments/coatosil-7001-copolymer/coatosil-additives-for-high-performance-coatings-and-inks.pdf
ポリエーテル変性シリコーンオイル,信越シリコーン,2023年05月09日,https://www.silicone.jp/products/personalcare/products/polyether_modified_silicones.shtml
PEG-3ジメチコンの基本情報・配合目的・安全性,化粧品成分オンライン,2023年05月16日,https://cosmetic-ingredients.org/surfactants-emulsifying-agents/12982/
CoatOSil* Additives for High Performance Coatings and Inks,Momentive Performance Materials Inc.,2023年05月09日,https://www.momentive.com/docs/default-source/productdocuments/coatosil-7001-copolymer/coatosil-additives-for-high-performance-coatings-and-inks.pdf
ポリエーテル変性シリコーンオイル,信越シリコーン,2023年05月09日,https://www.silicone.jp/products/personalcare/products/polyether_modified_silicones.shtml
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi
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