Title:
ポジ型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP7334683
Kind Code:
B2
Abstract:
A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.
Inventors:
Jun Hatakeyama
Application Number:
JP2020107821A
Publication Date:
August 29, 2023
Filing Date:
June 23, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C08F212/14; C08F220/34; C08F220/38; G03F7/004; G03F7/20
Domestic Patent References:
| JP2008239918A |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office
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