レジスト材料及びパターン形成方法

Title:

レジスト材料及びパターン形成方法

Document Type and Number:

Japanese Patent JP7334684

Kind Code:

B2

Abstract:

A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

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Inventors:

Jun Hatakeyama
Noriyuki Fujiwara

Application Number:

JP2020107831A

Publication Date:

August 29, 2023

Filing Date:

June 23, 2020

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

G03F7/004; G03F7/038; G03F7/039; G03F7/20

Domestic Patent References:

JP2002229190A

Attorney, Agent or Firm:

Patent Attorney Corporation Eimei International Patent Office

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