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Patent Searching and Data


Title:
ON-PRESS EXPOSURE AND ON-PRESS PROCESS OF LITHOGRAPHIC MATERIAL
Document Type and Number:
Japanese Patent JP2002321331
Kind Code:
A
Abstract:

To offer a lithographic method possible to conduct an on-press process together with automatic plate loading and on-press exposure in all the lithographic press.

The method consists of six stages: (i) a web of an imaging material including (1) a soft lithographic base material having a hydrophilic surface and (2) an image recording layer removable with a single-fluid ink or with the single-fluid ink by being exposed to heat and light are rewound from a supply spool, (ii) the imaging material is wounded around a cylinder of a printing press, (iii) the image recording layer is exposed to the heat or the light image-wise, (iv) a printing master is obtained by supplying the single- fluid ink and processing the image recording layer, (v) printing is conducted by supplying the single-fluid ink to the printing master installed in a plate cylinder of the printing press, and (vi) the printing master is taken out of the plate cylinder (preferably by winding up with an uptake spool).


Inventors:
VANDER AA JOSEPH
VERMEERSCH JOAN
Application Number:
JP2002033909A
Publication Date:
November 05, 2002
Filing Date:
February 12, 2002
Export Citation:
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Assignee:
AGFA GEVAERT NV
International Classes:
G03F7/004; B41C1/055; B41C1/10; B41M5/36; B41N1/14; G03F7/00; (IPC1-7): B41C1/055; B41N1/14; G03F7/00; G03F7/004
Attorney, Agent or Firm:
Heiyoshi Odashima