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Title:
PROCESS FOR PRODUCING PLANAR TYPE WAVEGUIDE STRUCTURE AND WAVEGUIDE STRUCTURE
Document Type and Number:
Japanese Patent JP2000039532
Kind Code:
A
Abstract:

To build an optical core in such a manner that an optimum objective region encloses a core layer and prevents the outer diffusion of a doping material by fluorinating the just deposited layer before depositing the cover layer of a core structure.

A lower layer 2 thicker than the core is first produced on a substrate 1 surface. This lower layer 2 is formed of silicon oxide doped with, for example, boron oxide and is sintered on a wafer of, for example, silicon. The surface of the lower layer 2 is etched with a soln. contg. the fluoride. Next, the core layer 3 of the silicon oxide is deposited on a boundary layer 4 contg. the fluoride. This glass layer 3 is doped with, for example, the boron oxide in order to increase the refractive index of glass material. Net, the entire part of the structure surface including the lower layer 2 and a waveguide structure 3 is treated with the soln. contg. the fluoride. As a result, the silicate layer is slightly removed and the boundary layer is fluorinated. The upper cover layer 5 is deposited after the formation of the fluoride layer.


Inventors:
WEBER DIETER
Application Number:
JP18754399A
Publication Date:
February 08, 2000
Filing Date:
July 01, 1999
Export Citation:
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Assignee:
CIT ALCATEL
International Classes:
G02B6/13; G02B6/12; G02B6/132; G02B6/136; (IPC1-7): G02B6/13; G02B6/12
Attorney, Agent or Firm:
Yoshio Kawaguchi (2 outside)