Title:
PRODUCTION OF MATERIAL HAVING HARD LOW-FRICTION LAYER ON ITS SURFACE
Document Type and Number:
Japanese Patent JP3295968
Kind Code:
B2
Abstract:
PURPOSE: To coat the surface of a material with a hard low-frictional layer having excellent lubricating property by subjecting the surface of the material to discharge treatment by plasma CVD at specified temp. in an atmosphere of nitrogen compd. gas and carbon compd. gas.
CONSTITUTION: A material to be treated (carbon steel, aluminum, etc.,) are disposed in a vacuum chamber. The residual gas in the chamber is evacuated, a gas for temp. elevation (hydrogen, etc.,) is introduced, and discharge is started to heat the material to 100-400°C by plasma energy. Then, a silicon compd. gas having silicon and hydrogen and/or silicon, hydrogen and carbon as the main constitutional elements (such as Si(CH3)4) and a carbon compd. gas (CH4) are introduced to produce a gas atmosphere (10-2-10Torr) to form a thin film of carbon-hydrogen-carbon on the surface of the base body. Thereby, the hard low-frictional layer can be easily formed on the base body and the obtd. layer has about 2000 Hv hardness, about ≤0.05 frictional coefft. and excellent adhesion property to the base body.
Inventors:
Kazuyuki Oguri
Hideo Tachikawa
Hideo Tachikawa
Application Number:
JP17748792A
Publication Date:
June 24, 2002
Filing Date:
June 10, 1992
Export Citation:
Assignee:
Toyota Central R & D Labs.
International Classes:
C23C16/26; C23C16/27; C23C16/42; C23C16/50; C30B29/04; (IPC1-7): C23C16/27; C23C16/42; C30B29/04
Domestic Patent References:
| JP3240957A | ||||
| JP5842472A |
Attorney, Agent or Firm:
Hiroshi Ohkawa