Title:
PRODUCTION OF PHOSPHONIUM SALT COMPOUND HAVING ACRYL GROUP
Document Type and Number:
Japanese Patent JP3721224
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain the subject compound useful as a cationic polymer raw material, an antistatic agent, an antimicrobial agent, etc., in high purity and in a high yield by reacting a specific unsaturated aliphatic carboxylic acid halide with a hydroxyalkylphosphonium salt compound.
SOLUTION: An unsaturated aliphatic carboxylic acid halide of formula I (R1 is H, CH3; X is Cl, Br, I) (e.g. methacryloyl chloride) is reacted with a hydroxyalkylphosphonium chloride of formula II (A is an alkylene; Y is Cl, Br, I; R2-R4 are each a 1-8C alkyl, a cycloalkyl, an aryl, an alkaryl, an aralkyl, etc.) [e.g. tri-n-butyl(hydroxymethyl)phosphonium choloride] to obtain the objective acryl group-having phosphonium salt compound of formula III [e.g. tri-n- butyl(methacryloyloxymethyl)phosphonium chloride].
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Inventors:
Tadashi Sugiya
Tsutomu Watanabe
Tsutomu Watanabe
Application Number:
JP6659296A
Publication Date:
November 30, 2005
Filing Date:
March 22, 1996
Export Citation:
Assignee:
Nippon Chemical Industry Co., Ltd.
International Classes:
C07F9/54; (IPC1-7): C07F9/54
Domestic Patent References:
| JP5170712A | ||||
| JP3106860A |
Attorney, Agent or Firm:
Michiteru Soga
Yoshio Kobayashi
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Masahisa Hase
Tetsuo Kuroiwa
Yoshio Kobayashi
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Masahisa Hase
Tetsuo Kuroiwa