Title:
QUARTZ FURNACE TUBE FOR SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD FOR CONTROLLING HEAT-TREATING TEMPERATURE OF SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPH07183241
Kind Code:
A
Abstract:
PURPOSE: To construct a characteristic treating condition at every kind of semiconductor substrate by changing the temperature lowering speed during the heat-treating process of each kind of semiconductor substrate.
CONSTITUTION: Since quartz tubes 2 are wound around a quartz furnace tube 1 and the tubes 2 are made independent from each other at every position in the tube 1, a suitable temperature lowering condition can be applied to each position in the tube 1 when the temperature in the furnace tube 1 is lowered by introducing a gas to the tube 1 through the tube 2.
Inventors:
NITTA RYUJI
Application Number:
JP32358593A
Publication Date:
July 21, 1995
Filing Date:
December 22, 1993
Export Citation:
Assignee:
NEC YAMAGUCHI LTD
International Classes:
H01L21/22; (IPC1-7): H01L21/22
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)
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