Title:
RESIST REMOVAL SYSTEM AND RESIST REMOVAL METHOD
Document Type and Number:
Japanese Patent JP2003318088
Kind Code:
A
Abstract:
To provide a resist removal system and a resist removal method for effectively removing resist.
The resist removal system comprises a surface breaking apparatus for partially breaking the surface of the resist formed on a substrate, and a solution processing apparatus for dissolving the resist of which surface has been partially broken by the surface breaking apparatus. The partial breakage of the resist surface facilitates the penetration of the solution into the resist when the resist is dissolved with the solution, thus making it possible to remove the resist more effectively.
Inventors:
HOSHINO SATOHIKO
SEKIGUCHI KENJI
ORII TAKEHIKO
NAKAMORI MITSUNORI
SEKIGUCHI KENJI
ORII TAKEHIKO
NAKAMORI MITSUNORI
Application Number:
JP2002121641A
Publication Date:
November 07, 2003
Filing Date:
April 24, 2002
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
G03F7/42; B24B29/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/42
Attorney, Agent or Firm:
Suyama Saichi