Title:
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023143838
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, a resin, and a resist composition containing the same.SOLUTION: There are provided: a salt represented by formula (I); an acid generator; a resin containing a structural unit represented by a specific formula; and a resist composition containing the same.SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2023045213A
Publication Date:
October 06, 2023
Filing Date:
March 22, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C309/12; C07C309/17; C07C381/12; C07D309/12; C08F20/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP