Title:
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023143845
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, an acid generator, a resin, and a resist composition containing the same.SOLUTION: There are provided: an acid generator containing a salt represented by formula (I); and a resist composition containing the same. [In the formula, R1-R3 each represent a hydroxy group or the like; R4-R9 each represent a halogen atom, a haloalkyl group or the like; R10 represents an acid-labile group; A1-A3 each represent a hydrocarbon group; Qb1 and Qb2 each represent a hydrogen atom, a fluorine atom or the like; Lb1 represents a saturated hydrocarbon group; and L10 represents a single bond or a hydrocarbon group.]SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2023045548A
Publication Date:
October 06, 2023
Filing Date:
March 22, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D333/76; C07C309/12; C08F20/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP