Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023160798
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula, Ar1 and Ar2 each represent naphthalene, anthracene or phenanthrene; R1 and R2 each represent -O-R10, -O-CO-O-R10 or the like; R10 represents an acid-labile group; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent a hydrocarbon group, provided that the hydrocarbon group may have a substituent, and -CH2- contained in the hydrocarbon group may be substituted with -O-, -CO-, -S- or -SO2-; m1 represents an integer of 1-5; m2 and m8 represent integers of 0-5; m4 and m5 represent integers of 0-7; m7 represents an integer of 0-4; 1≤m1+m7≤5; 0≤m2+m8≤5; and AI- represents an organic anion.]SELECTED DRAWING: None
Inventors:
HOMMA HARUKA
YASUE RISA
ICHIKAWA KOJI
YASUE RISA
ICHIKAWA KOJI
Application Number:
JP2023069345A
Publication Date:
November 02, 2023
Filing Date:
April 20, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C43/225; C07C43/29; C07C69/712; C07C69/94; C07C309/06; C07C309/58; C07D307/00; C07D321/10; C08F222/12; C08F222/26; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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