Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7356315
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition containing the acid generator.SOLUTION: The salt is represented by formula (I) [where Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; Xrepresents *-CO-O-, *-O-CO- or the like; Land Leach represent a single bond or a divalent saturated hydrocarbon group; Rrepresents an optionally substituted cyclic hydrocarbon group; m3 represents 2 or 3; Rrepresents a halogen atom or an alkyl group; m4 represents an integer of 0-4; and Zrepresents an organic cation].SELECTED DRAWING: None
Inventors:
Katsuhiro Komuro
Kunifumi Yamaguchi
Koji Ichikawa
Kunifumi Yamaguchi
Koji Ichikawa
Application Number:
JP2019183821A
Publication Date:
October 04, 2023
Filing Date:
October 04, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2011095700A | ||||
| JP2018150295A | ||||
| JP2005097254A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP