Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7356316
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator containing the salt, and a resist composition containing the acid generator.SOLUTION: The salt is represented by formula (I) [where Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; Xrepresents *-CO-O-, *-O-CO- or the like; Land Leach represent a single bond or a saturated hydrocarbon group; Rrepresents an optionally substituted cyclic hydrocarbon group; m3 represents an integer of 1-4; Rrepresents a halogen atom or an alkyl group; m4 represents an integer of 0-3; and Zrepresents an organic cation].SELECTED DRAWING: None
Inventors:
Katsuhiro Komuro
Natsuki Okada
Koji Ichikawa
Natsuki Okada
Koji Ichikawa
Application Number:
JP2019183822A
Publication Date:
October 04, 2023
Filing Date:
October 04, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013116885A | ||||
| JP2010106236A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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