Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7385453
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the acid generator.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [Q1, Q2, Q11 and Q12 each represent F or a perfluoroalkyl group; R1, R2, R11 and R12 each represent H, F or a perfluoroalkyl group; z and z1 each represent an integer of 0-6; X1 and X11 each represent *-CO-O-, *-O-CO-, *-O-CO-O- or the like; L1 and L11 each represent a single bond or a divalent saturated hydrocarbon group; R3, R4, R5 and R6 each represent a halogen atom or an alkyl group optionally having a halogen atom; m3, m4, m5 and m6 each represent an integer of 0-4; and Z+ and Z11+ each represent an organic cation.]SELECTED DRAWING: None
Inventors:
Yukako Adachi
Yuko Mukai
Koji Ichikawa
Yuko Mukai
Koji Ichikawa
Application Number:
JP2019223824A
Publication Date:
November 22, 2023
Filing Date:
December 11, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C309/12; C07C381/12; C08L101/02; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2008013551A | ||||
| JP2005122134A |
Foreign References:
| WO2016126209A1 | ||||
| WO2018020974A1 |
Other References:
Journal of Polymer Science, Part A: Polymer Chemistry,2013年,51(9),p.1956-1962
Proceedings of SPIE,vol.7639,2010年,p.76392C/1-76392C/8
Proceedings of SPIE,vol.7639,2010年,p.76392C/1-76392C/8
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP