Title:
METHOD AND APPARATUS FOR GENERATING PATTERN DATA FOR ELECTRON BEAM LITHOGRAPHY AND ELECTRON BEAM LITHOGRAPHY SYSTEM
Document Type and Number:
Japanese Patent JP3246551
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To enhance throughput of electron beam lithography by performing bind processing for correcting the binding shift between respective synthesized pattern data following to synthesis processing and subjecting the resulting bind pattern data to division processing thereby eliminating the binding shift.
SOLUTION: Binding shift between respective synthesized pattern data is corrected by bind processing and then division processing is performed at a division processing section. In the bind processing, a synthesized pattern data is located on XY coordinate and divided into (n) (an integer of 2 or above) rectangular regions by introducing a dividing line in the direction parallel with the X axis (step a). The rectangular regions are then enlarged or contracted partially or entirely in the direction parallel with the X axis thus correcting the binding shift (step b). Subsequently, the rectangular regions are bound again in order to obtain a bind pattern data (step c).
Inventors:
Ken Nakajima
Application Number:
JP6054599A
Publication Date:
January 15, 2002
Filing Date:
March 08, 1999
Export Citation:
Assignee:
NEC
International Classes:
H01L21/027; G03F1/20; G03F1/68; G03F1/70; G03F7/20; G06F17/50; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP60100426A | ||||
| JP62162329A | ||||
| JP2218115A | ||||
| JP7211607A |
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)
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