Title:
SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JP2004014737
Kind Code:
A
Abstract:
To solve the problem of deterioration in fine machining properties accompanied by an increase in a current value in a complementary division mask for electron beam projection exposure.
In the mask that is complementarily divided in the electron beam projection exposure, a pattern requiring high dimensional accuracy and the other patterns are arranged at one mask and the other masks, respectively.
Inventors:
SHIGENIWA AKIYOSHI
YAMAMOTO JIRO
MURAI FUMIO
FUKUDA HIROSHI
YAMAMOTO JIRO
MURAI FUMIO
FUKUDA HIROSHI
Application Number:
JP2002165252A
Publication Date:
January 15, 2004
Filing Date:
June 06, 2002
Export Citation:
Assignee:
RENESAS TECH CORP
International Classes:
G03F1/20; G03F1/68; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20
Attorney, Agent or Firm:
Katsuo Ogawa
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