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Title:
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2013153163
Kind Code:
A
Abstract:

To provide a semiconductor device with high aperture ratio or a manufacturing method thereof, and to provide a semiconductor device with low power consumption or a manufacturing method thereof.

The semiconductor device comprises: a conductive layer having light transmission characteristics which functions as a gate electrode; a gate insulating film formed on the conductive layer having the light transmission characteristics; a semiconductor layer formed on the conductive layer having the light transmission characteristics which functions as the gate electrode via the gate insulating film; and a conductive layer having light transmission characteristics which is electrically connected to the semiconductor layer and functions as a source electrode or a drain electrode.


Inventors:
KIMURA HAJIME
Application Number:
JP2013005118A
Publication Date:
August 08, 2013
Filing Date:
January 16, 2013
Export Citation:
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Assignee:
SEMICONDUCTOR ENERGY LAB
International Classes:
H01L21/336; G02F1/1368; G09F9/00; G09F9/30; H01L21/28; H01L21/3205; H01L21/768; H01L23/522; H01L23/532; H01L27/32; H01L29/417; H01L29/423; H01L29/49; H01L29/786; H01L51/50; H05B33/14; H05B33/26
Domestic Patent References:
JP2011040726A2011-02-24
JP2009302520A2009-12-24
JP2013008990A2013-01-10