Title:
SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS57113241
Kind Code:
A
Abstract:
PURPOSE:To simultaneously enable the measurement of the basic characteristics in the vicinity of a scribing line at the time of measuring the electric characteristics of a semiconductor integrated circuit by inserting a semiconductor element for measuring the basic characteristics in or at the periphery of the scribing line. CONSTITUTION:There are provided a P<+> type diffused layer 2 for measuring the sheet resistance value of a P<+> type diffused layer, an N<+> diffused type layer 3 for measuring the sheet resistance of the N<+> type diffused layer, a polycrystalline Si 4 for measuring the sheet resistance value in case that N<+> is diffused or implanted in the polycrystalline Si, a polycrystalline Si 5 for measuring the sheet resistance value in case that the P<+> is diffused or implanted in the polycrystalline Si, and a terminal 6 for electrically measuring. In this manner, the sheet resistance values and the electric characteristics of the semiconductor integrated circuit can be measured simultaneously.
Inventors:
MORITA NAOYUKI
Application Number:
JP18815980A
Publication Date:
July 14, 1982
Filing Date:
December 30, 1980
Export Citation:
Assignee:
SUWA SEIKOSHA KK
International Classes:
H01L21/66; H01L21/822; H01L27/04; (IPC1-7): H01L21/66