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Title:
SEMICONDUCTOR LASER ELEMENT, PHOTOMASK AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JPH02310986
Kind Code:
A
Abstract:

PURPOSE: To perform a wavelength multiplex communication or a coherent communication with one semiconductor laser element sections by providing effective refractive index or/and diffraction grating pitch of resonators of respective unit semiconductor laser to be different ones from those of resonators of other unit semiconductor lasers.

CONSTITUTION: Unit semiconductor laser sections A, B, C of a semiconductor laser element 1 are composed of DFB lasers, and the widths W1, W2, W3 of active layers 4 and the pitches a1, a2, a3 of diffraction gratings 21 are different (W1>W2>W3, a1>a2>a3). As a result, a laser light 20 having a wavelength of 1553nm of the emitting light is radiated from the laser section A having W1=1.5μm, a1=2405, a laser light 20 having a wavelength of 1543nm is irradiated from the laser section B having W2=1.0μm, a2=2400, and a laser light 20 having a wavelength of 1533nm is radiated from the laser section C having W3=0.65μm, a3=2395.


Inventors:
NAKA HIROSHI
HIRAO MOTONAO
Application Number:
JP13412189A
Publication Date:
December 26, 1990
Filing Date:
May 25, 1989
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01S5/12; H01S5/40; H01S5/00; (IPC1-7): H01S3/18
Attorney, Agent or Firm:
Akita Haruki