To improve the structure of a sintering and vapor depositing material by incorporating specified oxide into a vapor depositing material by specified weight%.

In a stabilized sintering and vapor depositing material using titanium oxide as the base, titanium oxide has a compsn. of TiOx, and (x)=1.4 to 1.8. This vapor depositing material contains oxides from the groups of zirconium oxide (ZrO2), hafnium oxide (HfO2), yttrium oxide (Y2O3) and ytterbium oxide (Y2O3) by 0.1 to 10wt.% as stabilizing additives in a uniformly dispersed state. Preferably, these oxides are present in the vapor depositing material by 0.5 to 5wt.%, more preferably, by about 2.5wt.%. In this way, the problem that fine parts are largely formed in sintering and varpor depositing stages can be solved.