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Patent Searching and Data


Title:
STAGE AND APPARATUS
Document Type and Number:
Japanese Patent JP2006303363
Kind Code:
A
Abstract:

To provide a stage mounted with substrates used for a manufacturing process of photo masks or the like whereby whether or not the substrates are accurately mounted on a prescribed position on the stage can simply be discriminated, and to provide an apparatus provided with the stage.

The stage is provided with one or more switches located on the surface of the stage being a side on which one of the substrates is in contact, wherein the switches are located at positions of the stage at which all the switches are depressed only when the substrates are mounted at the regular position; and a means for informing operators of the stage about it only when all the switches are depressed. The means for informing the operators of the stage about it only when all the switches are depressed emits light and is visually recognized. The apparatus is provided with the stage.


Inventors:
MISAWA KAORU
Application Number:
JP2005126284A
Publication Date:
November 02, 2006
Filing Date:
April 25, 2005
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
H01L21/68