To provide such a substrate end face cleaning device which shortens the time required for cleaning and does not contaminate the main pattern parts and rear surface of a photomask, etc.

A substrate 71 held by substrate-fixing arms 21 moves to a prescribed position and is set approximately near to the central axis position of scrubbing brushes 11. Next, simultaneously when the scrubbing brushes 11 move to the end faces of the substrate 71, detergents are injected like showers from the scrubbing brushes 11 to the substrate end face and the scrubbing brushes 11, by which the cleaning of the opposite substrate end faces on one side is carried out. Further, the substrate is rotated 90° by a substrate-fixing chuck 32 and is again moved approximately near to the central axis position of scrubbing brushes 11 by the substrate-fixing arms 21 and the cleaning of the opposite substrate end faces on the other side is carried out.